On April 6, Yin Zhiyao, chairman and general manager of Advanced Micro-Fabrication Equipment Inc. China, disclosed that the plasma etching equipment developed by the company has entered the customer's 5nm production line.

Yin Zhiyao said that the company's plasma etching equipment has been used in international first-line customers from 65nm to 14nm, 7Nm and 5nm and other advanced IC Processing and manufacturing lines and advanced packaging production lines.

Among them, the 12 inch high-end etching equipment developed by the company has been used in the most advanced production lines of international well-known customers, and has been used in the processing of several key steps in devices of 5 nm and below.

In addition, the company's MOCVD equipment has been put into mass production in the production line of leading customers in the industry.

According to the introduction, plasma etching machine is a key equipment in chip manufacturing, which is used for micro carving on the chip. The processing accuracy of each line and deep hole is one thousandth to one thousandth of the hair diameter, and the precision control requirements are very high.

Advanced Micro-Fabrication Equipment Inc. China also confirmed this statement on the interactive platform, saying that the company's etching equipment has indeed entered the 5 nm production line.